Operated by:
Center for Advanced Microstructures & Devices (CAMD, Louisiana State University), and the
Institute for Micromanufacturing (IfM, LaTech University)

 

A. Characteristics:

This beamline can operate in two modes - a 'white' light mode without any optics and a 'mirror' light mode.

'White' light mode

• 'White' spectrum, no optics, 2 Beryllium windows, 1^st window, 100 µm thick , 2^nd window 120 µm thick
• transmitted bandpass spectrum: 2.0 keV – 7 keV (10 keV @ 1.45 GeV)
• vertically integrated power incident on to the mask (100 mA): 314 mW/mrad @ 1.3 GeV, 730 mW/mrad horizontal acceptance @ 1.45 GeV
• source to exposure plane distance: 10.35 m.
• horizontal acceptance at mask plane: 10 milliradians
• horizontal beam width at the exposure plane: 104 mm.

'Mirror' light mode

• 2 Si mirrors, coated with one layer of Cr (Cr thickness > 120 nm)
• 1^st mirror is water-cooled, 2^nd mirror is un-cooled
• grazing angle: 0.5 deg – 1.2 deg corresponding to 8.73 mrad – 21 mrad
• distance source point – center 1^st mirror: ~ 3 m
• horizontal acceptance 1^st mirror: ~ 14 mrad

Scanner and Filter

• Filters:
  • Currently the following filters can be used:

Filter 2:        6.8 µm Al Filter 3:        6.7 µm Al Filter 4:        6.3 µm Al Filter 5:        5.8 µm Al Filter 6:      61.0 µm Al Filter 7:      50.0 µm Kapton Filter 8:    100.0 µm Kapton Filter 9:      42.0 µm Graphite Filter 10:    42.0 µm Graphite Filter 11:    42.0 µm Graphite Al:              ρ= 2.70 g/ccm Kapton:       ρ= 1.42 g/ccm Graphite:     ρ= 2.25 g/ccm

• Scanner: DEX02 from Jenoptik GmbH
  • maximum length of vertical scan is 100 mm.
  • maximum velocity is 50 mm/s
  • mask formats are 5" standard NIST, modified NIST, large format, and
  • 4" stainless steel ring
  • Substrate: standard 4" wafer and 4.75" stainless steel mold insert blank
    
    
  Special features: dark chamber environment, tilt/rotate option, aligned exposure option and mask/substrate cooling capabilities.

B. Power Flux Spectra of XRLM1 Beamline in 'White' light mode

C. Beamline Drawing (side-view)

D. Personnel:

Beamline Manager:

Jost Goettert / CAMD (225) 578-4666 Tel. (225) 578-6954 Fax jost@lsu.edu

 

 

Operated by:
Institute for Micromanufacturing (IfM, LaTech University), and the
Center for Advanced Microstructures & Devices (CAMD, Louisiana State University)

A. Characteristics:

• 'White' spectrum, no optics, 2 Beryllium windows, 1^st window, 250 µm thick, 2^nd window 150 µm thick
• transmitted bandpass spectrum: 2.6 keV – 7 keV (10 keV @ 1.45 GeV)
• vertically integrated power incident on to the mask (100 mA): 226 mW/mrad @ 1.3 GeV, 577 mW/mrad @ 1.45 GeV
• source to exposure plane distance: 10.7 m.
• horizontal acceptance: 9.5 milliradians
• horizontal beam width at the exposure plane: 102 mm.

  Scanner and Filter

  • Filters:
    • Currently the following filters can be used:

Filter 1:         40.0 µm Graphite Filter 2:         42.0 µm Graphite Filter 3:           6.8 µm Al Filter 5:           6.5 µm Al Al:             ρ= 2.70 g/ccm Graphite:   ρ= 2.25 g/ccm

• Scanner: X-ray scanner from Jenoptik GmbH
• maximum length of vertical scan is 100 mm.
• maximum velocity is 50 mm/s
• mask formats are 5" standard NIST, modified NIST, large format, and 4" stainless steel ring
• Substrate: standard 4" wafer and any dimension not larger than 4.75"

Photon BPM

A photon BPM is installed in the front end section and provides actual information of the position of the photon beam during exposure.

B. Power Flux Spectra of XRLM2 Beamline

C. Option

For temporary experiments other setups can be inserted into an approx. 1 m long section behind the 1^st beryllium window. Experiments can be operated either in air or connect to the beryllium window with a CF 8" flange. Installation of these experiments is dependent upon exposure needs at the scanner and will be granted upon approval.

D. Personnel:

Beamline Managers:

Phil Coane / IfM (318) 257-5108 Tel. (318) 257-5104 Fax pcoane@coes.latech.edu

Jost Goettert / CAMD (225) 578-4666 Tel. (225) 578-6954 Fax jost@lsu.edu

 

 

XRLM 3 Beamline (Port 7B)

Operated by: CAMD/LSU

A. Beamline Characteristics:

• 'White' spectrum, no optics, 175 µm thick beryllium window
• transmitted bandpass spectrum: 2.0 keV – 7 keV (10 keV @ 1.45 GeV)
• vertically integrated power incident on to the mask (100 mA): 350 mW/mrad @ 1.3 GeV, 790 W/mrad @ 1.45 GeV
• source to exposure plane distance: 10m.
• Horizontal acceptance: 9.1 milliradians
• horizontal beam width at the exposure plane: 91 mm.

  Scanner and Filter

  • Filters:
    • Currently the following filters can be used:

Filter 1:         6.0 µm Al Filter 2:         9.5 µm Al Al:             ρ= 2.70 g/ccm

• Scanner:
• maximum length of vertical scan is 65 mm.
• maximum velocity is 12.5 mm/s
• mask formats are 5" standard NIST, modified NIST, large format and 4" stainless steel ring
• substrate standard 4" wafer and any dimension not larger than 4.75"

B. Power Flux Spectra of XRLM3 Beamline

C. Beamline Drawing (side-view)

 

D. Personnel:

Beamline Manager:

Zhong-Geng Ling / CAMD
(225) 578-9355 Tel.
(225) 578-6954 Fax
zling@lsu.edu